Social media buzz about Huawei testing domestically developed UV machine.
Uses EUV light source called Laser Induced Discharge Plasma (LDP).
Compared to ASML's Laser Produced Plasma (LPP), LDP is more efficient, smaller, simpler, and energy-efficient.
EUV Light Source
Produces 13.5 nanometer light.
ASML's LPP Method:
CO2 laser hits a tin droplet twice.
Tin plasma emits 13.5 NM light.
Needs a complex optical system with 6-10 mirror reflections.
Inefficiency due to less than 70% reflection by mirrors.
Initial goal: 250 Watts output.
Historical Context of Light Source Development
DPP Method (Discharge Produced Plasma):
Uses electrical current between electrodes to produce EUV light.
Generates plasma at 200,000°C.
Investigated in 1950s for nuclear fusion energy.
Involved two companies: EUVA (Japan) and Philips Extreme UV.
Different fuel options: Xenon, Tin, Lithium.
Tin emerged as best candidate.
Issues with electrode repetition and thermal damage.
Evolution to LDP
LDP Method (Laser Induced Discharge Plasma):
Uses rotating tin supply discs as electrodes.
More reliable laser hitting due to constant rotation.
Offers efficiency and debris mitigation benefits.
Philips Extreme UV involved in development, later renamed Extreme Technologies by Ushio Group.
Comparison and Challenges
LDP offers scalability and stability, but faces challenges in power scaling.
LDP could not match LPP in output power scaling.
ASML switched from LDP to LPP due to efficiency and scalability.
China's Efforts in EUV Technology
China exploring all known EUV light source methods, including LDP.
Researchers at Harbin Institute of Technology investigating LDP.
Publications suggest less groundbreaking progress.
Belief that China will achieve EUV eventually, with time and resources.
Speculations and Observations
Potential for China’s EUV machines to be less economically competitive initially.
Possibility of technological twists in Chinese machines.
ASML should consider integrating successful aspects from Chinese developments.
Conclusion
EUV is a man-made technology, achievable with time and resources.
China's persistence and willingness to invest heavily may lead to breakthroughs.
ASML must remain vigilant and adaptable to maintain competitive edge.
Note: The lecture emphasized that while China is making progress, economic competitiveness and technological parity with ASML might still take time. However, their aggressive pursuit is expected to yield results sooner than anticipated.